Groupe de Physique Statistique

Equipe 106, Institut Jean Lamour

                     
Accueil
Accès
Personnel
Publications
Articles dans des revues à comité de lecture
Lettres
Actes de conférences invités
Actes de conférences
Non publié
Thèse
Habilitation à diriger des recherches
Epistémologie, histoire des sciences
Articles à vocation pédagogique
Livres
Edition d'ouvrage
Chapitres de livre
Vulgarisation
Séminaires
Ateliers
Rencontres
Ecoles
International
Grp Travail
Theses, Postes
Enseignement

Articles dans des revues à comité de lecture

The influence of substrate and thickness on the magnetic properties of dc sputtered Ni thin films
Bourzami A., Ghebouli B., Kharmouche A., Guittoum A., Layadi A., Lenoble O., Piecuch M.
Annales de Chimie: Science des Materiaux 30 (2005) 207

The effects of the substrate and thickness on the magnetic properties of Ni thin films were investigated. Series of Ni thin films were prepared by dc diode sputtering on four different substrates: glass, Si(111), Si(100) and mica; the Ni thickness ranged from about 295 AÌŠ to 3080 AÌŠ. By X-ray diffraction, we observed that Ni grown on glass has no texture. On the other hand Ni deposited on Si gets the <111> preferred orientation for all samples. Kerr effect experiments were done using light of wavelength λ = 6328 AÌŠ and a magnetic field varying from 0 to 7 kOe. Longitudinal and polar Kerr effect measurements were performed on these samples. Kerr rotation Î?k and coercivity Hc were deduced from the hysteresis curves. These parameters were studied as a function of the substrate, the film thickness, the grain size and the texture. The experimental results are interpreted and discussed.



Haut de page